2021 | Chun-Chieh Chang, Shin-Chun Kuo,
Hsyi-En Cheng, Hou-Tong Chen, Zu-Po Yang, “Broadband titanium nitride
disordered metasurface absorbers”, Optics Express 29 (2021) 42813-42826. |
2019 | Hsyi-En Cheng, Wen-Lung Li and Zu-Po Yang, “Enhancement of Hydrogen Evolution Reaction by
Pt Nanopillar-Array Electrode in Alkaline Media and the Effect of Nanopillar
Length on the Electrode Efficiency”, Int. J. Hydrogen Energy 44 (2019) 30141-30150 |
2018 | Hsyi-En Cheng, Chi-Hsiu Hung, Ing-Song Yu, Zu-Po
Yang, “Strongly Enhancing Photocatalytic Activity of TiO2 Thin Films
by Multi-Heterojunction Technique”, Catalysts
8 (2018) 440 |
2018 | Tsung-Cheng Chen, Tsuo-Chuan Yang, Hsyi-En Cheng, Ing-Song Yu, Zu-Po Yang, “Single Material TiO2 Thin Film by Atomic Layer Deposition for Antireflection and Surface Passivation Applications on P-Type C-Si”, Applied Surface Science 451 (2018) 121–127 |
2017 | Chien-Ming Fan Chiang, Bo-Ren Chang, Ya-Ju Lee, Monima Sarma, Zu-Po Yang, Hai-Ching Su, Hsyi-En Cheng , Ken-Tsung Wong, “Improving color saturation of blue light-emitting electrochemical cells by plasmonic filters”, Organic Electronics 51 (2017) 70-75 |
2017 | Ing-Song Yu, Hsyi-En Cheng, Chun-Chieh Chang, Yan-Wei Lin, Hou-Tong Chen, Yao-Chin Wang, Zu-Po Yang, “Substrate-insensitive atomic layer deposition of plasmonic titanium nitride films”, Optical Materials Express 7 (2017) 777-784 |
2017 | Hsyi-En Cheng, Chun-Yuan Lin and Ching-Ming Hsu, Fabrication of SnO2-TiO2 core-shell nanopillar-array films for enhanced photocatalytic activity, Applied Surface Science 396 (2017) 393–399 |
2016 | Zu-Po Yang, Hsyi-En Cheng, I-Hsuan Chang, Ing-Song Yu, “Atomic Layer Deposition TiO2 Films and TiO2/SiNx Stacks Applied for Silicon Solar Cells”, Applied Sciences, 6, 233 (2016) |
2016 | Hsyi-En Cheng, Chia-Hui Wen and Ching-Ming Hsu, “Morphology, composition and electrical properties of SnO2:Cl thin films grown by atomic layer deposition”, J. Vac. Sci. Technol. A34, 01A112 (2016) |
2014 | Hsyi-En Cheng, Shu-Yin Lin, De-Cih Tian, ‘Fabrication of Nickel Nanopillar-Array Electrodes for Water Electrolysis’, J. Electrochem. Soc. 161(14) E202-E206 (2014) |
2013 | Ing-Song Yu, Yu-Wun Wang, Hsyi-En Cheng, Zu-Po Yang, Chun-Tin Lin (2013, Dec). Surface Passivation and Antireflection Behavior of ALD TiO2 on n-Type Silicon for Solar Cells. International Journal of Photoenergy, 2013, Article ID 431614. (SCI, 10/80, OPTICS). NSC 101-2218-E-259-001. |
2013 | Wei-Chih Lai, Cheng-Hsiung Yen, Jhen-Zih Li, Ya-Yu Yang, Hsyi-En Cheng (2013, Aug). GaN-Based Light-Emitting Diodes on Electrochemically Etched n¯-GaN Template. IEEE Photonics Technology Letters, 25(15), 1531-1534. (SCI, 19/80, OPTICS). |
2013 | Y.-H. Chang, C.-M. Liu, H.-E. Cheng, C. Chen, “Effect of Geometric Nanostructures on the Absorption Edges of 1D and 2D TiO2 Fabricated by Atomic Layer Deposition”, ACS Appl. Mater. Interfaces 2013, 5, 3549−3555 |
2012 | Yung-Huang Chang, Chih Chen, Hsyi-En Cheng, “The hetero-junction effects on photocarrier transportation direction of TiO2 nanotubes fabricated by atomic layer deposition”, Nanoscale Research Letters, 2012, 7:231 |
2012 | Y.-H. Chang, C.-M. Liu, C. Chen, H.-E. Cheng, “The Effect of Geometric Structure on Photoluminescence Characteristics of 1-D TiO2 Nanotubes and 2-D TiO2 Films Fabricated by Atomic Layer Deposition” J. Electrochem. Soc. 159 (7) D401-D405 |
2012 | Chih Chen, Yung-Huang Chang, Hsyi-En Cheng, and Tien-chang Lu, “The differences in optical characteristics of TiO2 and TiO2/AAO nanotube arrays fabricated by atomic layer deposition", J. Electrochem. Soc. 159 (5) K136-K140 (2012) |
2012 | H.-E. Cheng, D.-C. Tian, K.-C. Huang, “Properties of SnO2 Films Grown by Atomic Layer Deposition”, Procedia Engineering 36 (2012) 510–515 (EI) |
2011
| Hsyi-En Cheng, Yu-Ru Chen, Wen-Tuan Wu, Ching-Ming Hsu,Effect of nitrogen doping concentration on the properties of TiO2 films grown by atomic layer deposition,Materials Science and Engineering Bvol.176,no.7,pp596–599,2011
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2011
| Chien-Min Liu, Chih Chen, Hsyi-En Cheng,Ultraviolet Photoresponse of TiO2 Nanotube Arrays Fabricated by Atomic Layer Deposition,Electrochemical and Solid-State Lettersvol.14,no.6,ppK33-K35,2011
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2011
| Chien-Min Liu, Chih Chen, Hsyi-En Cheng,Growth Mechanism of TiO2 Nanotube Arrays in Nanopores of Anodic Aluminum Oxide on Si Substrates by Atomic Layer Deposition,Journal of the Electrochemical Societyvol.158,no.3,ppK58-K63,2011
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2010
| 鄭錫恩、郭彥良、邱南榮,以核殼奈米柱結構提升氮摻雜二氧化鈦薄膜之光電響應,真空科技vol.23,no.2,pp45-50,2010
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2010
| Yung-Huang Chang, Chien-Min Liu, Yuan-Chieh Tseng, Chih Chen, Chia-Chuan Chen and Hsyi-En Cheng,Direct probe of heterojunction effects upon photoconductive properties of TiO2 nanotubes fabricated by atomic layer deposition,Nanotechnologyvol.22,no.21,pp225602-22568,2010
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2010
| Wen-Tuan Wu, Chia-Jen Chang, Hsyi-En Cheng, Ching-Ming Hsu, Kun-San Tsen,Continuous cell air-extracting technique used for fast cell filling of flexible liquid-crystal displays,J. Vac. Sci. Technol. Bvol.28,no.4,pp673-677,2010
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2010
| Hsyi-En Cheng, S. H. Hsiao, Deng-Maw Lu,Enhancement of photoelectrochemical properties of ALD TiO2 films by light-trapping effect,Electrochemical and Solid-State Lettersvol.13,no.5,ppD19-D22,2010
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2009
| Hsyi-En Cheng, Chung-Ho Lai, Chien-Lung Huang,Properties of ITO transparent conducting films grown by sputtering at room temperature,南台科技大學學報vol.34,no.4,pp11-15,2009
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2009
| Hsyi-En Cheng, Ching-Ming Hsu, and Yi-Chih Chen,Substrate Materials and Deposition Temperature Dependent Growth Characteristics and Photocatalytic Properties of ALD TiO2 Films,JOURNAL OF ELECTROCHEMICAL SOCIETYvol.156,no.8,ppD275-D278,2009
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2009
| Hsyi-En Cheng*, Meng-Rong Lee, Yu-Hung Hsieh, Ching-Ming Hsu,Atomic Layer Deposition of Nitrogen-Doped Titanium Dioxide Films Using Titanium Chloride and Ammonia Water as the Precursors,Journal of the Australian Ceramic Societyvol.45,no.2,pp64-68,2009
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2009
| Ching-Ming Hsu, Chieh-Yang Huang, Hsyi-En Cheng, Wen-Tuan Wu,Flexible organic light-emitting diodes consisting of a platinum doped indium tin oxide anode,JOURNAL OF PHYSICS D-APPLIED PHYSICSvol.42,no.10,pp105301,2009
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2008
| Tien-Chai Lin, Hsyi-En Cheng, Shih-Hung Tang, Wu-Chien Liu, Antony H.C. Lee,The characteristics and residual stress of aluminum nitride films grown by two-stage sputtering of mid-frequency power,Materials Science and Engineering Avol.480,no.1-2,pp226-231,2008
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2008
| Tien-Chai Lin, Hsyi-En Cheng, Shih-Hung Tang, Wu-Chien Liu, Antony H.C. Lee,The characteristics and residual stress of aluminum nitride films grown by two-stage sputtering of mid-frequency power ,Materials Science and Engineering A ,vol.480 ,no.n1-2 ,pp.226–231 ,2008
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2008
| M.-J. Chiang, C.-W. Wu, H.-E. Cheng,Effect of oxygen flow rate and temperature on the structure of DC sputtered nanocyrtsalline copper oxide films,Advanced Materials Researchvol.31,no.,pp129-131,2008
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2008
| Hsyi-En Chenga and Chia-Chuan Chen,Morphological and photoelectrochemical properties of ALD TiO2 films ,Journal of The Electrochemical Society ,vol.155 ,no.9 ,pp.D604-D607 ,2008
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2008
| Hsyi-En Cheng, Wen-Jen Lee, Ching-Ming Hsu, Ming-Hsiung Hon, Chien-Lung Huang,Visible light activity of nitrogen-doped TiO2 thin films grown by atomic layer deposition,Electrochemical and Solid-State Lettersvol.11,no.10,ppD81-D84,2008
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2008
| Hsyi-En Cheng, Wen-Jen Lee, Ching-Ming Hsu, Ming-Hsiung Hon, Chien-Lung Huang,Visible light activity of nitrogen-doped TiO2 thin films grown by atomic layer deposition ,Electrochemical and Solid-State Letters ,vol.11 ,no.10 ,pp.D81-D84 ,2008
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2008
| Hsyi-En Cheng, Chia-Chuan Chen,Morphological and photoelectrochemical properties of ALD TiO2 films,Journal of The Electrochemical Societyvol.155,no.9,ppD604-D607,2008
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2006
| Hsyi-En Cheng, Chien-Tang Mao,In-situ substrate heating and postdeposition annealing on the compositions and electrical properties of tantalum oxide thin films grown by reactive sputtering ,Japanese Journal of Applied Physics ,vol.45 ,no.1A ,pp.160-164 ,2006
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2006
| Hsyi-En Cheng, and Wen-Jen Lee,Properties of TiN films grown by atomic-layer chemical vapor deposition with a modified gaseous-pulse sequence ,Materials Chemistry & Physics ,vol.97 ,pp.315-320 ,2006
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2006
| Hsu CM, Liu CF, Cheng HE, Wu WT,Low-temperature nickel-doped indium tin oxide anode for flexible organic light-emitting devices ,Journal of Electronic Materials ,vol.35 ,pp.383-387 ,2006
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2005
| Hsyi-En Cheng, Wen-Jen Lee, C.-M. Hsu,The effect of deposition temperature on the properties of TiN diffusion barriers prepared by atomic layer chemical vapor deposition ,Thin Solid Films ,vol.485 ,no.1-2 ,pp.59-65 ,2005
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2005
| Chien-Hsin Yang, Yi-Kai Chih, Hsyi-En Cheng, and Cheng-Ho Chen,Nanofibers of self-doped polyaniline ,Polymer ,vol.46 ,no.24 ,pp.10688-10698 ,2005
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2004
| Hsyi-En Cheng, Yao-Wei Wen,Correlation between process parameters, microstructure and hardness of TiN films by chemical vapor deposition ,Surface & Coatings Technology ,vol.179 ,no.1 ,pp.103-109 ,2004
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2003
| Hsyi-En Cheng, Tien-Chai Lin, and Wen-Chien Chen,Preparation of [0 0 2] oriented AlN thin films by mid frequency reactive sputtering technique ,Thin Solid Films ,vol.425 ,no.1-2 ,pp.85-89 ,2003
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2003
| Hsyi-En Cheng, Chien-Tang Mao,The effect of substrate temperature on the physical properties of tantalum oxide thin films grown by reactive radio-frequency sputtering ,Materials Research Bulletin ,vol.38 ,no.14 ,pp.1841-1849 ,2003
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1996
| Hsyi-En Cheng, Tain-Tsair Lin, Min-Hsiung Hon,Multiple twins induced [110] preferred growth in TiN and SiC films prepared by CVD ,Scripta Materialia ,vol.35 no.1 ,pp.113-116 ,1996
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1996
| Hsyi-En Cheng, Min-Hsiung Hon,Texture formation in titanium nitride films prepared by chemical vapor deposition ,Journal of Applied Physics ,vol.79 ,no.10 ,pp.8047-8053 ,1996
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1996
| Hsyi-En Cheng, Min-Hsiung Hon,Influence of TiN coating thickness on the wear of Si3N4-based cutting tools ,Surface & Coatings Technology ,vol.81 ,no.2-3 ,pp.256-261 ,1996
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1995
| Hsyi-En Cheng, Min-Hsiung Hon,Growth Characteristics and Properties of TiN Coating by Chemical Vapor Deposition ,Journal of the Electrochemical Society ,vol.142 ,no.5 ,pp.1573-1578 ,1995
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1994
| Hsyi-En Cheng, Min-Hsiung Hon,Growth mechanism of star-shaped TiN crystals ,Journal of Crystal Growth ,vol.142 ,no.1-2 ,pp.117-123 ,1994
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