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鄭錫恩

姓    名 鄭 錫 恩 職    稱 教授
校 內 分 機   ( 06 )-2533131 # 3623
E - mail   sean@stust.edu.tw
最 高 學 歷   國立成功大學 / 材料博士
研 究 領 域   半導體製程、薄膜工程、太陽能光電

經    歷
服務機關
職稱
起迄年月
南台科技大學
助理教授 / 副教授 / 教授 /系主任
2000 / 08 至        迄今
南亞科技(股)公司
製程資深工程師 / 課經理
1997 / 11 至 2000 / 07
棨驊工業(股)公司
總經理室 - 特別助理
1996 / 04 至 1997 / 10
林陽玻璃(股)公司
濺鍍課研發工程師
1991 / 04 至 1992 / 07

獲 獎 榮 譽
 1. 2011 國際奈米研討會海報論文佳作獎二篇
 2. 2010 南台科大國科會特殊優秀人才獎
 3. 2010 南台科大第十三屆學生專題競賽特優獎指導老師
 4. 2008 年材料年會海報論文佳作獎一篇
 5. 2006 台灣鍍膜協會年會論文優等獎一篇
 6. 2006 績優導師

期 刊 論 文
2011 Hsyi-En Cheng, Yu-Ru Chen, Wen-Tuan Wu, Ching-Ming Hsu,Effect of nitrogen doping concentration on the properties of TiO2 films grown by atomic layer deposition,Materials Science and Engineering Bvol.176,no.7,pp596–599,2011
2011 Chien-Min Liu, Chih Chen, Hsyi-En Cheng,Ultraviolet Photoresponse of TiO2 Nanotube Arrays Fabricated by Atomic Layer Deposition,Electrochemical and Solid-State Lettersvol.14,no.6,ppK33-K35,2011
2011 Chien-Min Liu, Chih Chen, Hsyi-En Cheng,Growth Mechanism of TiO2 Nanotube Arrays in Nanopores of Anodic Aluminum Oxide on Si Substrates by Atomic Layer Deposition,Journal of the Electrochemical Societyvol.158,no.3,ppK58-K63,2011
2010 鄭錫恩、郭彥良、邱南榮,以核殼奈米柱結構提升氮摻雜二氧化鈦薄膜之光電響應,真空科技vol.23,no.2,pp45-50,2010
2010 Yung-Huang Chang, Chien-Min Liu, Yuan-Chieh Tseng, Chih Chen, Chia-Chuan Chen and Hsyi-En Cheng,Direct probe of heterojunction effects upon photoconductive properties of TiO2 nanotubes fabricated by atomic layer deposition,Nanotechnologyvol.22,no.21,pp225602-22568,2010
2010 Wen-Tuan Wu, Chia-Jen Chang, Hsyi-En Cheng, Ching-Ming Hsu, Kun-San Tsen,Continuous cell air-extracting technique used for fast cell filling of flexible liquid-crystal displays,J. Vac. Sci. Technol. Bvol.28,no.4,pp673-677,2010
2010 Hsyi-En Cheng, S. H. Hsiao, Deng-Maw Lu,Enhancement of photoelectrochemical properties of ALD TiO2 films by light-trapping effect,Electrochemical and Solid-State Lettersvol.13,no.5,ppD19-D22,2010
2009 Hsyi-En Cheng, Chung-Ho Lai, Chien-Lung Huang,Properties of ITO transparent conducting films grown by sputtering at room temperature,南台科技大學學報vol.34,no.4,pp11-15,2009
2009 Hsyi-En Cheng, Ching-Ming Hsu, and Yi-Chih Chen,Substrate Materials and Deposition Temperature Dependent Growth Characteristics and Photocatalytic Properties of ALD TiO2 Films,JOURNAL OF ELECTROCHEMICAL SOCIETYvol.156,no.8,ppD275-D278,2009
2009 Hsyi-En Cheng*, Meng-Rong Lee, Yu-Hung Hsieh, Ching-Ming Hsu,Atomic Layer Deposition of Nitrogen-Doped Titanium Dioxide Films Using Titanium Chloride and Ammonia Water as the Precursors,Journal of the Australian Ceramic Societyvol.45,no.2,pp64-68,2009
2009 Ching-Ming Hsu, Chieh-Yang Huang, Hsyi-En Cheng, Wen-Tuan Wu,Flexible organic light-emitting diodes consisting of a platinum doped indium tin oxide anode,JOURNAL OF PHYSICS D-APPLIED PHYSICSvol.42,no.10,pp105301,2009
2008 Tien-Chai Lin, Hsyi-En Cheng, Shih-Hung Tang, Wu-Chien Liu, Antony H.C. Lee,The characteristics and residual stress of aluminum nitride films grown by two-stage sputtering of mid-frequency power,Materials Science and Engineering Avol.480,no.1-2,pp226-231,2008
2008 Tien-Chai Lin, Hsyi-En Cheng, Shih-Hung Tang, Wu-Chien Liu, Antony H.C. Lee,The characteristics and residual stress of aluminum nitride films grown by two-stage sputtering of mid-frequency power ,Materials Science and Engineering A ,vol.480 ,no.n1-2 ,pp.226–231 ,2008
2008 M.-J. Chiang, C.-W. Wu, H.-E. Cheng,Effect of oxygen flow rate and temperature on the structure of DC sputtered nanocyrtsalline copper oxide films,Advanced Materials Researchvol.31,no.,pp129-131,2008
2008 Hsyi-En Chenga and Chia-Chuan Chen,Morphological and photoelectrochemical properties of ALD TiO2 films ,Journal of The Electrochemical Society ,vol.155 ,no.9 ,pp.D604-D607 ,2008
2008 Hsyi-En Cheng, Wen-Jen Lee, Ching-Ming Hsu, Ming-Hsiung Hon, Chien-Lung Huang,Visible light activity of nitrogen-doped TiO2 thin films grown by atomic layer deposition,Electrochemical and Solid-State Lettersvol.11,no.10,ppD81-D84,2008
2008 Hsyi-En Cheng, Wen-Jen Lee, Ching-Ming Hsu, Ming-Hsiung Hon, Chien-Lung Huang,Visible light activity of nitrogen-doped TiO2 thin films grown by atomic layer deposition ,Electrochemical and Solid-State Letters ,vol.11 ,no.10 ,pp.D81-D84 ,2008
2008 Hsyi-En Cheng, Chia-Chuan Chen,Morphological and photoelectrochemical properties of ALD TiO2 films,Journal of The Electrochemical Societyvol.155,no.9,ppD604-D607,2008
2006 Hsyi-En Cheng, Chien-Tang Mao,In-situ substrate heating and postdeposition annealing on the compositions and electrical properties of tantalum oxide thin films grown by reactive sputtering ,Japanese Journal of Applied Physics ,vol.45 ,no.1A ,pp.160-164 ,2006
2006 Hsyi-En Cheng, and Wen-Jen Lee,Properties of TiN films grown by atomic-layer chemical vapor deposition with a modified gaseous-pulse sequence ,Materials Chemistry & Physics ,vol.97 ,pp.315-320 ,2006
2006 Hsu CM, Liu CF, Cheng HE, Wu WT,Low-temperature nickel-doped indium tin oxide anode for flexible organic light-emitting devices ,Journal of Electronic Materials ,vol.35 ,pp.383-387 ,2006
2005 Hsyi-En Cheng, Wen-Jen Lee, C.-M. Hsu,The effect of deposition temperature on the properties of TiN diffusion barriers prepared by atomic layer chemical vapor deposition ,Thin Solid Films ,vol.485 ,no.1-2 ,pp.59-65 ,2005
2005 Chien-Hsin Yang, Yi-Kai Chih, Hsyi-En Cheng, and Cheng-Ho Chen,Nanofibers of self-doped polyaniline ,Polymer ,vol.46 ,no.24 ,pp.10688-10698 ,2005
2004 Hsyi-En Cheng, Yao-Wei Wen,Correlation between process parameters, microstructure and hardness of TiN films by chemical vapor deposition ,Surface & Coatings Technology ,vol.179 ,no.1 ,pp.103-109 ,2004
2003 Hsyi-En Cheng, Tien-Chai Lin, and Wen-Chien Chen,Preparation of [0 0 2] oriented AlN thin films by mid frequency reactive sputtering technique ,Thin Solid Films ,vol.425 ,no.1-2 ,pp.85-89 ,2003
2003 Hsyi-En Cheng, Chien-Tang Mao,The effect of substrate temperature on the physical properties of tantalum oxide thin films grown by reactive radio-frequency sputtering ,Materials Research Bulletin ,vol.38 ,no.14 ,pp.1841-1849 ,2003
1996 Hsyi-En Cheng, Tain-Tsair Lin, Min-Hsiung Hon,Multiple twins induced [110] preferred growth in TiN and SiC films prepared by CVD ,Scripta Materialia ,vol.35 no.1 ,pp.113-116 ,1996
1996 Hsyi-En Cheng, Min-Hsiung Hon,Texture formation in titanium nitride films prepared by chemical vapor deposition ,Journal of Applied Physics ,vol.79 ,no.10 ,pp.8047-8053 ,1996
1996 Hsyi-En Cheng, Min-Hsiung Hon,Influence of TiN coating thickness on the wear of Si3N4-based cutting tools ,Surface & Coatings Technology ,vol.81 ,no.2-3 ,pp.256-261 ,1996
1995 Hsyi-En Cheng, Min-Hsiung Hon,Growth Characteristics and Properties of TiN Coating by Chemical Vapor Deposition ,Journal of the Electrochemical Society ,vol.142 ,no.5 ,pp.1573-1578 ,1995
1994 Hsyi-En Cheng, Min-Hsiung Hon,Growth mechanism of star-shaped TiN crystals ,Journal of Crystal Growth ,vol.142 ,no.1-2 ,pp.117-123 ,1994

研 討 會 論 文
2010 鄭錫恩、林淑、鎳奈米柱金屬電極之製備,第五屆全國氫能與燃料電池學術研討會
2010 Kuan-Chun Huang, Hsyi-En Cheng,The characteristics of SnO2 films grown by atomic layer deposition,International Conference on Optics and Photonics in Taiwan>
2010 Hsyi-En Cheng , Yu-Chi Yang,Fabrication of flexible TiO2nanopillar photoelectrode,The 9th International Symposium on Advanced Technology (ISAT 9)
2009 Hsyi-En Cheng and Yu-Ru Chen,Effect of NH3-to-H2O injection ratio on the properties of atomic layer deposited N-doped TiO2 films,TACT 2009 International Thin Films Conference
2009 B.J. Yeh, H. E. Cheng, Y.H. Hsieh,Fabrication of nanoporous copper films by selective dealloying of Cu-Fe alloy,2009 International symposium on nanoscience and technology
2009 Chun-Te Lee, Hsyi-En Cheng,Enhancement of photocurrent response of N-doped TiO2 films by using a porous underlayer,8th International Symposium on Advanced Technology
2008 陳羿志,陳家全,鄭錫恩,謝煜弘,基材種類對原子層沉積 TiO2膜性質之影響,2008台灣鍍膜科技年會
2008 章詠湟,陳智,鄭錫恩,陳家全,運用原子層沉積系統成長二氧化鈦奈米管之光檢測器應用,2008年材料年會
2008 Y.-R. Chen, H. E. Cheng, Y.-H. Hsieh,Effect of argon purge amonut on the photoelectrochemical properties of nitrogen-doped tio2 films grown by atomic layer deposition,2008 International symposium on nanoscience and technology
2003 譚立威,湯士弘,鄭錫恩, "電漿輔助蒸著有機發光元件保護膜之抗水氣滲透特性研究", 2003年鍍膜年會, 論文編號:G11.
2003 湯士弘,鄭錫恩,林天財, "氮化鋁薄膜體聲波振盪器之模擬研究", 2003年鍍膜年會, 論文編號:D08.
2003 Hsyi-En Cheng, Chien-Tang Mao, "The structure and breakdown voltage of tantalum oxide thin films grown by reactive sputtering", International symposium on nano science and technology, Tainan, Taiwan, 4-7 November 2003, p197.
2003 Hsyi-En Cheng, Wen-Jen Lee, "The characteristics of TiN films grown by atomic layer chemical vapor deposition", International symposium on nano science and technology, Tainan, Taiwan, 4-7 November 2003, p56.
2003 鄭錫恩、李文仁、毛健棠, "即時退火與沉積後退火對反應濺鍍氧化鉭薄膜結構與電性之影響", 2003年材料年會, .半導體材料.
2003 鄭錫恩、李文仁, "以原子層化學氣相沉積法製備氮化鈦薄膜特性研究", 2003年電子元件暨材料研討會, pp.13-16.
2002 林天財, 鄭錫恩, 陳文建,劉伍健, "以中頻濺射成長高優選取向AlN薄膜技術之研發", 2002年鍍膜年會, pp.399-402.
2002 毛健棠, 鄭錫恩, 陳文建, 劉伍健, 林天財, "AlN成長於LiNbO3基板之表面聲波元件特性研究", 2002年材料年會, G.半導體材料.

產 學 合 作
2011  顛覆傳統PU泡棉之環保透氣床墊與椅墊開發評估
2011 100年度補助技專校院建立特色典範計畫-綠能智慧電動車研發暨人才培育計畫-子計畫3 綠能與照明技術
2011  100學年度「產學攜手合作計畫」
2007  斜向濺鍍具特徵形貌氧化銦錫(ITO)之微結構與成長特性研究

國 科 會 計 畫
2010  二氧化錫/二氧化鈦核殼奈米管柱之製備及其應用於染料敏化太陽能電池之研究
2009  原子層沉積高比表面積、高效能TiO2-xNx太陽能製氫電極之開發(3/3)
2008  原子層沉積高比表面積、高效能TiO2-xNx太陽能製氫電極之開發(2/3)
2007  原子層沉積高比表面積、高效能TiO2-xNx太陽能製氫電極之開發 
2007  斜向濺鍍具特徵形貌氧化銦錫(ITO)之微結構與成長特性研究
2006  原子層沉積氮摻雜二氧化鈦薄膜之微結構、能隙及光電流特性研究 
2005  原子層沉積二氧化鈦半導體光觸媒及其在可見光效率提升之研究
2004  原子層化學氣相沉積次90奈米銅導線金屬擴散阻障層之研究
2003  原子層化學氣相沉積氮化鈦薄膜之成長特性與性質研究
2002  有機電激發光裝置之封裝開發
2002  電漿輔助蒸著有機發光元件多層保護膜之抗水/氧滲透特性研究

指 導 碩 士 班 論 文
2010  原子層沉積二氧化錫薄膜特性研究 黃冠竣 
2009  Ni-TiO2核殼奈米柱陣列之製備及其光電化學特性研究 葉柏均
2009  模板輔助原子層沉積奈米結構二氧化鈦之光觸媒特性研究 陳羿志 
2009  以多孔性底材提升二氧化鈦光電響應之研究 李俊德 
2008  原子層沉積氮摻雜二氧化鈦薄膜之光電化學特性研究 陳宥儒
2006  原子層沉積氮摻雜二氧化鈦薄膜之特性研究 李孟融
2005  原子層沉積二氧化鈦薄膜光觸媒之特性研究 黃群勝
2005  反應濺鍍純二氧化鈦與氮摻雜二氧化鈦之薄膜特性研究 杜怡昶 
2004  以原子層化學氣相沉積法成長氮化鈦薄膜之特性研究 李文仁
2004  兩階段磁控濺鍍法成長氮化鋁壓電薄膜之研究 湯士弘
2004  反應性濺鍍氧化鉭與氧化鉿薄膜特性之研究 譚立威
2003  即時退火與沉積後退火對反應濺鍍氧化鉭薄膜物理性質之影響研究 毛健棠
2003  反應性射頻磁控濺鍍法成長矽化物有機發光元件透明保護膜之研究 文耀葦
2002  以中頻反應性磁控濺射法成長[002]優選取向氮化鋁薄膜之研究 陳文建

大 學 部 專 題
2008  以不同金屬基版與應用與染料敏化太陽能電池 黃冠竣,林耿民
2008  反應性磁控濺鍍摻雜鎵(Ga)之氧化鋅(ZnO)薄膜光電特性研究 張嘉容,楊育綺
2008  以陽極氧化呂模板製備鎳奈米柱研究 林佑聰,陳逸凡
2006  濺鍍製成參數對三氧化鎢薄膜成長及光響應特性之影響 許展榮/林坦蔚
2006  兩階段成長微米級厚度多晶矽薄膜之研究 李欣達
2006  原子層沉積二氧化鈦薄膜之顯微結構分析 李慶峰/周盈慧
2002  OLED防護層透水性實驗 林金標/李慶禧






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